A manual, nosepiece type microscope which meets the various needs of observation, inspection, research and analysis across a wide range of industrial fields. Higher NA and a longer working distance than ever before means superior optical performance and efficient digital imaging.
Politica de securitate (editeaza cu modulul Reasigurare pentru clienti)
Politica de livrare (editeaza cu modulul Reasigurare pentru clienti)
Politica de returnare (editeaza cu modulul Reasigurare pentru clienti)
Digital imaging combined with advanced optical system
A manual, nosepiece type microscope which meets the various needs of observation, inspection, research and analysis across a wide range of industrial fields. Higher NA and a longer working distance than ever before means superior optical performance and efficient digital imaging.
Max. sample size: 150 x 150 mm.
Microscope type
Dedicated reflected illumination models
Manual type
Modularized microscope body applicable with various observations and tasks
Compatible with brightfield, darkfield, simple polarizing, DIC, epifluorescence and two-beam interferometry observations. It supports diverse and advanced research, analysis and inspection.
Compatible observation methods:
Compatible stages
LV-S32 3x2 stage (Stroke: 75 x 50 mm with glass plate) *Can be fitted with LV-S32SPL ESD plate
LV-S6 6x6 stage (Stroke: 150 x 150 mm) *Can be fi tted with LV-S6WH wafer holder / LV-S6PL ESD plate
LV-SRP P revolving stage
P-GS2 G stage 2 (Used with stage adapter LV-SAD)
Newly developed CFI60-2 series
Newly developed CFI60-2 series provides the ultimate in long working distance levels and the most advanced chromatic aberration in a light weight body
CFI60-2 series offers higher NA and longer working distances than ever before.
Cod produs: Eclipse LV150N
Data sheet
Base unit
Inaltimea maxima a piesei masurabile: 38 mm (atunci cand este utilizat cu LVNU5AI U5AI si LV-S32 3x2 / LV-S64 6x4)
A manual, nosepiece type microscope which meets the various needs of observation, inspection, research and analysis across a wide range of industrial fields. Higher NA and a longer working distance than ever before means superior optical performance and efficient digital imaging.